f-255-10-355

Applications

Printed Circuit Boards
marking
engraving
cutting
structuring
Copper
marking
Plastics
marking
engraving
cutting
structuring
Glass/Crystal
marking
engraving
cutting
structuring
Ceramics
cutting
structuring

Technical Specifications

General
Wavelength355 nm
Maximum Input Beam Diameter 10 mm
Anti-Reflective CoatingStandard
Optics
Nominal Focal Length255 mm
Maximum Scan Field170 mm x 170 mm
Working Distance313.511 mm
Flange Focal Length373.211 mm
Minimum Spot Size16.57 μm
Mounting ThreadM85x1
Lens Diameter120 mm
Lens MaterialFused Silica
Cooling / Temp.
Cooling MethodAir

355 nm | Fused Silica

Model NameWavelengthNominal Focal LengthWorking DistanceMaximum Scan FieldMaximum Input Beam Diameter Minimum Spot SizeLens MaterialMounting ThreadLens DiameterCooling MethodInquiryDetail
f-130-10-355355 nm130 mm162.487 mm80 mm x 80 mm10 mm8.45 μmFused SilicaM85x190 mmAir
f-160-10-355355 nm160 mm193.892 mm100 mm x 100 mm10 mm10.39 μmFused SilicaM85x190 mmAir
f-170-10-355355 nm170 mm233.834 mm110 mm x 110 mm10 mm11.04 μmFused SilicaM85x1146 mmAir
f-210-10-355355 nm210 mm250.550 mm135 mm x 135 mm10 mm13.64 μmFused SilicaM85x190 mmAir
f-254-10-355355 nm254 mm300.716 mm160 mm x 160 mm10 mm16.4 μmFused SilicaM85x190 mmAir
f-254G-10-355355 nm254 mm311.075 mm160 mm x 160 mm10 mm16.5 μmFused SilicaM85x190 mmAir
f-254K-10-355355 nm254 mm309.300 mm160 mm x 160 mm10 mm16.5 μmFused SilicaM85x194 mmAir
f-255-10-355355 nm255 mm313.511 mm170 mm x 170 mm10 mm16.57 μmFused SilicaM85x1120 mmAir
f-255G-10-355355 nm255 mm304.580 mm175 mm x 175 mm10 mm8.72 μmFused SilicaM85x190 mmAir
f-330-10-355355 nm330 mm384.645 mm200 mm x 200 mm10 mm21.44 μmFused SilicaM85x190 mmAir
f-330-14-355355 nm330 mm377.274 mm200 mm x 200 mm14 mm15.31 μmFused SilicaM85x1120 mmAir
f-350-10-355355 nm350 mm409.613 mm210 mm x 210 mm10 mm22.7 μmFused SilicaM85x1120 mmAir
f-355-15-355355 nm355 mm471.471 mm240 mm x 240 mm15 mm15.38 μmFused SilicaM85x1140 mmAir
f-420-10-355355 nm420 mm491.500 mm300 mm x 300 mm10 mm14.26 μmFused SilicaM85x190 mmAir
f-420-14-355-W355 nm420 mm526.700 mm250 mm x 250 mm14 mm9.94 μmFused SilicaM85x1135 mmWater
f-470-10-355355 nm470 mm300.000 mm300 mm x 300 mm10 mm30.5 μmFused SilicaM85x1120 mmAir
f-500-10-355355 nm500 mm576.875 mm350 mm x 350 mm10 mm32.48 μmFused SilicaM85x190 mmAir
f-500-14-355355 nm500 mm564.276 mm350 mm x 350 mm14 mm23.2 μmFused SilicaM85x1120 mmAir
f-580-10-355355 nm580 mm678.400 mm450 mm x 450 mm10 mm19.71 μmFused SilicaM85x190 mmAir
f-580-14-355355 nm580 mm663.107 mm400 mm x 400 mm14 mm26.91 μmFused SilicaM85x1120 mmAir
f-730-10-355355 nm730 mm702.038 mm468 mm x 468 mm10 mm47.4 μmFused SilicaM85x190 mmAir
f-750-10-355355 nm750 mm840.730 mm550 mm x 550 mm10 mm24.73 μmFused SilicaM85x190 mmAir
f-750-14-355355 nm750 mm823.366 mm520 mm x 520 mm14 mm34.8 μmFused SilicaM85x1120 mmAir
f-840-10-355355 nm840 mm948.440 mm600 mm x 600 mm10 mm27.9 μmFused SilicaM85x190 mmAir
f-840-14-355355 nm840 mm893.653 mm600 mm x 600 mm14 mm38.98 μmFused SilicaM85x1120 mmAir
f-1090-14-355355 nm1,090 mm1,177.901 mm800 mm x 800 mm14 mm50.58 μmFused SilicaM85x1120 mmAir
f-1280-14-355355 nm1,280 mm1,162.709 mm885 mm x 885 mm14 mm59.39 μmFused SilicaM85x1120 mmAir
f-1450-14-355355 nm1,450 mm1,499.770 mm900 mm x 900 mm14 mm67.29 μmFused SilicaM85x1120 mmAir
f-1550-10-355355 nm1,550 mm1,175.390 mm1,070 mm x 1,070 mm10 mm100.7 μmFused SilicaM85x1120 mmAir